The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
Oct. 31, 2023
Galvion Incorporated, Montreal, CA;
Elaine Violet Craigie, Gatineau, CA;
Grzegorz Czeremuszkin, Pierrefonds, CA;
Vlad Lucuta, Newport, VT (US);
Thomas Moynihan, Dover, NH (US);
Mohamed Latreche, Dollard des Ormeaux, CA;
Enrick Gauthier, Laval, CA;
GALVION INCORPORATED, Montreal, CA;
Abstract
A system for forming a deep drawn helmet and method therefor are disclosed. The system includes a forming draw ring and a non-forming draw ring and supports a prepreg stack between a forming aperture of the forming draw ring and a non-forming aperture of the non-forming draw ring. The system clamps a flange portion of the prepreg stack between a contact surface of the forming draw ring and a contact surface of the non-forming draw ring, which forms a clamped assembly of the rings and the prepreg stack. The system then forms a deep drawn helmet preform from the prepreg stack of the clamped assembly. The same system or a different forming system then consolidates one or more of the preforms into a final deep drawn helmet. The system can control sliding of the flange during forming of the helmet preform without reducing the flange clamping force.