The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2025
Filed:
Aug. 29, 2021
Applicant:
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Inventors:
Assignee:
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, Daejeon, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10N 30/078 (2023.01); B06B 1/06 (2006.01); H10N 30/00 (2023.01); H10N 30/06 (2023.01); H10N 30/079 (2023.01); H10N 30/098 (2023.01); H10N 30/857 (2023.01); H10N 30/87 (2023.01);
U.S. Cl.
CPC ...
H10N 30/078 (2023.02); B06B 1/0696 (2013.01); H10N 30/06 (2023.02); H10N 30/079 (2023.02); H10N 30/098 (2023.02); H10N 30/708 (2024.05); H10N 30/857 (2023.02); H10N 30/87 (2023.02);
Abstract
The present invention relates to a method of preparing a shape-reconfigurable micropatterned polymer haptic material using an electric field technique, and more particularly, to a method of preparing a shape-reconfigurable micro-patterned polymer thin film and a haptic material by controlling the orientation of a liquid-crystalline organic polymer using an electric field control system and inducing the generation of defect structures having a regular microstructure array in a polymer film.