The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Feb. 22, 2022
Applicant:

Tower Semiconductor Ltd., Migdal Haemek, IL;

Inventors:

Naor Inbar, Migdal Haemek, IL;

Omer Katz, Migdal Haemek, IL;

Tzur Miller, Migdal Haemek, IL;

Ayala Elkayam, Migdal Haemek, IL;

Assignee:

Tower Semiconductor Ltd., Migdal Hemek, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 23/00 (2006.01); H01L 23/31 (2006.01); H10K 10/88 (2023.01); H10K 39/32 (2023.01); H10K 50/844 (2023.01); H10K 59/80 (2023.01);
U.S. Cl.
CPC ...
H01L 27/14627 (2013.01); H01L 23/3171 (2013.01); H01L 24/06 (2013.01); H01L 27/14685 (2013.01); H10K 10/88 (2023.02); H10K 39/32 (2023.02); H10K 50/844 (2023.02); H10K 59/873 (2023.02); H01L 2224/03831 (2013.01);
Abstract

A method for manufacturing optical unit, the method includes (a) obtaining an intermediate optical unit that comprises a semiconductor portion, a transparent organic layer, the array of organic microlenses and a protective layer; (b) depositing a protective mask above a first protective layer region; (c) removing, by applying a first etch process, the second protective layer region to expose a second region of the transparent organic layer; and (d) removing, by applying a second etch process, the second region of the transparent organic layer to expose the contact pads and removing the protective mask while maintaining the first protective layer portion.


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