The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2025
Filed:
Mar. 06, 2023
Clean Crop Technologies, Inc., Holyoke, MA (US);
Yaqoot Shaharyar, Northampton, MA (US);
Shardul Sreekumar, Easthampton, MA (US);
Michael DiFrancesco, Waterbury, CT (US);
Dominik Laszczkowski, Easthampton, MA (US);
Madhukar Prasad, Amherst, MA (US);
Sandon Hess, Northampton, MA (US);
Rachael Useted, Belchertown, MA (US);
Clean Crop Technologies, Inc., Holyoke, MA (US);
Abstract
A plasma treatment device is provided and includes a first electrode, a dielectric body supportive of the first electrode and a second mesh electrode having an opposite polarity as the first electrode and comprising a seating portion. The second mesh electrode is disposed proximate to the dielectric body to define a gap receptive of particles for collection in the seating portion. The gap is sized such that, with the second mesh electrode activated, a plasma field is generated to treat the particles in the seating portion. The seating portion is configured to retain the particles during treatment in opposition to ionic winds resulting from the plasma field.