The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Jan. 26, 2023
Applicant:

Microsoft Technology Licensing, Llc, Redmond, WA (US);

Inventors:

Abhishek Uday Kumar Shah, Seattle, WA (US);

Anudeep Sharma, Bothell, WA (US);

Mark A. Kromer, Snohomish, WA (US);

Jikai Ma, Redmond, WA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/25 (2019.01); G06F 9/30 (2018.01); G06F 9/32 (2018.01); G06F 9/50 (2006.01); G06F 9/54 (2006.01); G06F 11/30 (2006.01); G06F 16/16 (2019.01); G06N 3/08 (2023.01); G06N 20/00 (2019.01); G06N 20/20 (2019.01); G06N 3/044 (2023.01); G06N 3/045 (2023.01);
U.S. Cl.
CPC ...
G06F 9/328 (2013.01); G06F 9/30036 (2013.01); G06F 11/3006 (2013.01); G06F 16/164 (2019.01); G06N 20/20 (2019.01); G06F 9/5044 (2013.01); G06F 9/5066 (2013.01); G06F 9/5072 (2013.01); G06N 3/044 (2023.01); G06N 3/045 (2023.01); G06N 3/08 (2013.01);
Abstract

Methods, systems and computer program products are provided for automated runtime configuration for dataflows to automatically select or adapt a runtime environment or resources to a dataflow plan prior to execution. Metadata generated for dataflows indicates dataflow information, such as numbers and types of sources, sinks and operations, and the amount of data being consumed, processed and written. Weighted dataflow plans are created from unweighted dataflow plans based on metadata. Weights that indicate operation complexity or resource consumption are generated for data operations. A runtime environment or resources to execute a dataflow plan is/are selected based on the weighted dataflow and/or a maximum flow. Preferences may be provided to influence weighting and runtime selections.


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