The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Jan. 10, 2020
Applicant:

Dai Nippon Printing Co., Ltd., Tokyo, JP;

Inventors:

Tatsuya Kozakai, Okayama, JP;

Tomoyuki Horio, Tsukuba, JP;

Michiaki Takei, Okayama, JP;

Osamu Watanabe, Okayama, JP;

Keisuke Endou, Kashiwa, JP;

Takanobu Tadaki, Tsukuba, JP;

Kio Mizuno, Kuki, JP;

Atsushi Washio, Tsukuba, JP;

Keita Iwahara, Okayama, JP;

Sho Suzuki, Okayama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/111 (2015.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G02B 1/111 (2013.01); G02B 5/3025 (2013.01);
Abstract

To provide an antireflection member which not only has a low reflectance, but also is enhanced in scratch resistance, and an image display device comprising the antireflection member. An antireflection membercomprising a low refractive index layeron a transparent substrate, in which the low refractive index layerincludes a binder resin and silica particlesand, a ratio of Si element attributed to the silica particles, obtained by analysis of a surface region of the low refractive index layerby X-ray photoelectron spectroscopy, is 10.0 atomic percent or more and 18.0 atomic percent or less and a ratio of C element under the assumption that the ratio of Si element is defined to be 100 atomic percent is 180 atomic percent or more and 500 atomic percent or less.


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