The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Oct. 30, 2023
Applicant:

The Boeing Company, Chicago, IL (US);

Inventors:

Eric M. Chapman, Lake Tapps, WA (US);

Cory C. Cunningham, Auburn, WA (US);

Troy A. Haworth, Snohomish, WA (US);

Dana Alexander Henshaw, Seattle, WA (US);

Matthew Thomas Hollinger, Issaquah, WA (US);

Ashley Marie Jones, Seattle, WA (US);

Kevin Michael Mejia, Sammamish, WA (US);

Christopher Perez, Bothell, WA (US);

Russell William Waymire, Gig Harbor, WA (US);

Assignee:

The Boeing Company, Arlington, VA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/386 (2017.01); B29C 64/153 (2017.01); B29C 64/371 (2017.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B33Y 50/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/386 (2017.08); B29C 64/153 (2017.08); B29C 64/371 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/00 (2014.12);
Abstract

A method includes flowing gas within a chamber for first process parameters at a predetermined point in a laser focal plane and simulating the step of flowing gas within the chamber based on the value of the flow characteristic of the gas at the predetermined point in the laser focal plane so that a value of a simulated-flow characteristic of the gas at a predetermined point away from the laser focal plane is identified. The method comprises comparing the value of the simulated-flow characteristic of gas at the predetermined point away from the laser focal plane to a desired value of the simulated-flow characteristic and flowing gas within the chamber for second differing process parameters, when the value of the simulated-flow characteristic of the gas at the predetermined point away from the laser focal plane differs from the desired value of the simulated-flow characteristic is outside a predetermined range.


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