The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2025
Filed:
Oct. 16, 2022
Jason Nicholas Rich, Yarrow Point, WA (US);
Jason Nicholas Rich, Yarrow Point, WA (US);
[object Object];
Abstract
A unique filtering face-piece respirator or mask that is constructed of filtration media capable of sub-micron particle absorption or filtration. Utilizing existing and broadly available low cost media, the mask is patterned from a single sheet of material. It is constructed in a manner that creates an adequate seal as it fits snugly to the user's face, creates structure to ensure a low volume air gap, and deploys unique vertical pleats to increase surface area in order to decrease pressure drop across the mask. Specifically, the design enables the user to inhale and exhale with a pressure drop below 0.4 inches of water at elevated breathing rates of up to 110 liters per hour. Valve design and positioning enable more than 90% of used air to be exited the mask. Meeting these criteria, the mask is intended to be a low cost solution that provides protection from virus, air pollution, or other pathogens with little restriction, allowing subjectively 'comfortable' usage during sports and other highly aerobic activities.