The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Jul. 29, 2024
Applicant:

Signcomplex Limited, Shenzhen, CN;

Inventors:

Tiejun Wu, Shenzhen, CN;

Hailong Zhu, Shenzhen, CN;

Ji'an Wei, Shenzhen, CN;

Wenhai Liu, Shenzhen, CN;

Wenmao Wei, Shenzhen, CN;

Yongbo Zhu, Shenzhen, CN;

Assignee:

SIGNCOMPLEX LIMITED, LONGHUA DISTRICT, SHENZHEN, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10H 20/856 (2025.01); B29C 64/112 (2017.01); B29C 64/124 (2017.01); H01L 25/075 (2006.01); H10H 20/01 (2025.01);
U.S. Cl.
CPC ...
H10H 20/856 (2025.01); B29C 64/112 (2017.08); B29C 64/124 (2017.08); H01L 25/0753 (2013.01); H10H 20/0363 (2025.01);
Abstract

In the present disclosure, a light-blocking compound is simultaneously dripped into light-blocking compound setting grooves located on a left side and a right side of a light bead by using a compound dripping machine, so as to form two light-blocking dam colloids respectively disposed on the left side and the right side of the light bead on a compound-dripped surface of a light panel. After the light-blocking dam colloids are cured, a diffusion compound is dripped into a diffusion compound setting groove by using the compound dripping machine, so as to form a diffusion colloid on the two light-blocking dam colloids.


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