The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Nov. 07, 2019
Enevate Corporation, Irvine, CA (US);
Ian Browne, Orange, CA (US);
Benjamin Park, Mission Viejo, CA (US);
ENEVATE CORPORATION, Irvine, CA (US);
Abstract
Systems and methods are provided for control of furnace atmosphere for improving capacity retention of silicon-dominant anode cells. Furnace atmosphere may be controlled during processing of a silicon-dominated electrode in a furnace, with the processing including pyrolysis of the silicon-dominated electrode, and the controlling including setting or adjusting one or more of pressure of the furnace atmosphere, and composition of the furnace atmosphere. The controlling of the furnace atmosphere may be configured based on at least one environment condition. The at least one environment condition may be an oxygen-free environment.