The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Dec. 16, 2019
Applicant:

Unist(ulsan National Institute of Science and Technology), Ulsan, KR;

Inventors:

Kyung Rok Kim, Ulsan, KR;

Jae Won Jeong, Seoul, KR;

Young Eun Choi, Ulsan, KR;

Woo Seok Kim, Daegu, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H03K 19/094 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0928 (2013.01); H01L 29/66492 (2013.01); H01L 29/78 (2013.01); H01L 29/7833 (2013.01); H03K 19/09425 (2013.01);
Abstract

A transistor device includes a substrate, a source region provided on the substrate, a drain region spaced apart from the source region in a direction parallel to a top surface of the substrate, a pair of constant current generating patterns provided in the substrate to be adjacent to the source region and the drain region, respectively, a gate electrode provided on the substrate and between the source region and the drain region, and a gate insulating film interposed between the gate electrode and the substrate, wherein, the pair of constant current generating patterns generate a constant current between the drain region and the substrate, and the constant current is independent from a gate voltage applied to the gate electrode.


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