The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Jul. 01, 2022
Tata Consultancy Services Limited, Mumbai, IN;
Jayavardhana Rama Gubbi Lakshminarasimha, Bangalore, IN;
Gaurab Bhattacharya, Bangalore, IN;
Nikhil Kilari, Bangalore, IN;
Bagyalakshmi Vasudevan, Chennai, IN;
Balamuralidhar Purushothaman, Bangalore, IN;
Tata Consultancy Services Limited, Mumbai, IN;
Abstract
Traditional systems used for fashion attribute detection struggle to generate accurate predictions due to presence of large intra-class and relatively small inter-class variations in data related to the fashion attributes. The disclosure herein generally relates to image processing, and, more particularly, to a method and system for fashion attribute detection. The method proposes F-AttNet, an attribute extraction network to leverage the performance of fine-grained localized fashion attribute recognition. F-AttNet comprises Attentive Multi-scale Feature Encoder (AMF) blocks that encapsulate multi-scale fine-grained attribute information upon adaptive recalibration of channel weights. F-AttNet is designed by hierarchically stacking the AMF encoders to extract deep fine-grained information across multiple scales. A data model used by F-AttNet is trained using a novel γ-variant focal loss function for addressing the class imbalance problem by penalizing wrongly classified examples and incorporating separate importance to positive and negative instances.