The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Dec. 28, 2022
Apple Inc., Cupertino, CA (US);
Bertrand Nepveu, Montreal, CA;
Vincent Chapdelaine-Couture, Carignan, CA;
Emmanuel Piuze-Phaneuf, Los Gatos, CA (US);
APPLE INC., Cupertino, CA (US);
Abstract
The method includes: obtaining a first image of an environment from a first image sensor associated with first intrinsic parameters; performing a warping operation on the first image according to perspective offset values to generate a warped first image in order to account for perspective differences between the first image sensor and a user of the electronic device; determining an occlusion mask based on the warped first image that includes a plurality of holes; obtaining a second image of the environment from a second image sensor associated with second intrinsic parameters; normalizing the second image based on a difference between the first and second intrinsic parameters to produce a normalized second image; and filling a first set of one or more holes of the occlusion mask based on the normalized second image to produce a modified first image.