The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Sep. 23, 2022
United States of America As Represented BY the Administrator of Nasa, Washington, DC (US);
United States of America as represented by the Administrator of NASA, Washington, DC (US);
Abstract
A structured membrane fabrication method begins with a membrane wafer on a substrate and at least one thin-film on the membrane wafer such that portions of the membrane wafer are exposed. The exposed portions of the membrane wafer and each thin-film are covered with an acetone-inert protectant. Portions of the protectant are etched through to the membrane wafer while each thin-film remains fully covered by the protectant. A handle is coupled to the protectant with a wax that dissolves in acetone. Portions of the substrate are then removed to define and expose a contiguous region of the membrane wafer adjacent to each thin-film and the portions of the protectant so-etched. The wax is exposed to acetone so that it dissolves. The contiguous region of the membrane wafer is then etched through at the portions of the protectant so-etched. The protectant is then removed.