The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Jan. 22, 2024
Applicant:
Rolic Technologies Ag, Allschwil, CH;
Inventors:
David Pires, Giebenach, CH;
Mohammed Ibn-Elhaj, Allschwil, CH;
Assignee:
ROLIC TECHNOLOGIES AG, Allschwil, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01); B42D 25/23 (2014.01); B42D 25/29 (2014.01); B42D 25/328 (2014.01); B42D 25/355 (2014.01); B42D 25/364 (2014.01); G03H 1/00 (2006.01); G03H 1/02 (2006.01); G06K 19/06 (2006.01); G06K 19/16 (2006.01); G07D 7/00 (2016.01);
U.S. Cl.
CPC ...
G02B 5/0257 (2013.01); B42D 25/23 (2014.10); B42D 25/29 (2014.10); B42D 25/328 (2014.10); B42D 25/355 (2014.10); B42D 25/364 (2014.10); G02B 5/0252 (2013.01); G03H 1/0011 (2013.01); G03H 1/0244 (2013.01); G06K 19/06009 (2013.01); G06K 19/06037 (2013.01); G06K 19/16 (2013.01); G07D 7/0032 (2017.05);
Abstract
Optical elements with anisotropic, patterned surface relief microstructures in which information is encoded in the distribution of the orientation of different zones. From the analysis of the distribution of the light scattered from the element, the orientation distribution in the element and therefore the encoded information can be evaluated. The elements are particularly useful for securing documents and articles against counterfeiting and falsification.