The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Mar. 09, 2021
Leica Microsystems Nc, Inc., Durham, NC (US);
LEICA MICROSYSTEMS NC, INC., Durham, NC (US);
Abstract
A system for optimizing optics is provided. The system is configured to calibrate a position of a reference arm of an interferometric imaging system such that an image of a sample is visible when the sample is positioned at a working distance of an objective lens to provide an initial calibrated position. An image is obtained using the initial calibrated position. Image quality of the obtained image is assessed to determine if the obtained image is a valid image. A path length of the reference arm is adjusted if it is determined that the obtained image is not a valid image. A difference between the calibrated position of the reference arm and the adjusted position of the reference arm is calculated. System elements are adjusted based on the calculated difference such that the sample is visible when the sample is positioned at the working distance at the adjusted position.