The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Feb. 12, 2021
Applicant:
Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;
Inventors:
Michael Vergöhl, Braunschweig, DE;
Andreas Pflug, Braunschweig, DE;
Tobias Zickenrott, Braunschweig, DE;
Stefan Bruns, Braunschweig, DE;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/00 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/351 (2013.01); C23C 14/0036 (2013.01); C23C 14/357 (2013.01); C23C 14/505 (2013.01); C23C 14/547 (2013.01); H01J 37/32201 (2013.01); H01J 37/32366 (2013.01); H01J 37/32715 (2013.01); H01J 37/3405 (2013.01); H01J 37/3476 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/332 (2013.01);
Abstract
The invention relates to a device and a method for producing layers whose layer thickness distribution can be adjusted in coating systems with horizontally rotating substrate. A very homogeneous or a specific non-homogeneous distribution can be adjusted. The particle loading is also significantly reduced. The service life is significantly higher compared to other methods. Forming of parasitic coatings is reduced.