The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2025

Filed:

Dec. 16, 2019
Applicant:

Renishaw Plc, Wotton-under-Edge, GB;

Inventor:

Kevyn Barry Jonas, Clevedon, GB;

Assignee:

RENISHAW PLC, Wotton-under-Edge, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B25J 9/00 (2006.01); B25J 9/06 (2006.01); B25J 9/16 (2006.01); B25J 11/00 (2006.01); B25J 13/08 (2006.01); B25J 15/00 (2006.01); B25J 15/04 (2006.01);
U.S. Cl.
CPC ...
B25J 9/0084 (2013.01); B25J 9/06 (2013.01); B25J 9/1687 (2013.01); B25J 9/1692 (2013.01); B25J 11/0055 (2013.01); B25J 13/089 (2013.01); B25J 15/0019 (2013.01); B25J 15/04 (2013.01);
Abstract

A manufacturing system includes: a coordinate positioning machine having a structure moveable within a working volume of the machine, a drive arrangement for moving the structure around the working volume, and a positioning arrangement for determining the position of the structure within the working volume with a first accuracy; and a metrology arrangement to which the machine is removably couplable, such that when the machine is coupled to the metrology arrangement, with the structure being moved by the drive arrangement, the metrology arrangement is able to measure the position of the structure with a second accuracy that is higher than the first accuracy.


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