The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2025
Filed:
Mar. 16, 2022
National University Corporation Nagaoka University of Technology, Niigata, JP;
Fujikoshi Machinery Corp., Nagano, JP;
Toshiro Doi, Fukuoka, JP;
Hideo Aida, Niigata, JP;
Hidetoshi Takeda, Niigata, JP;
Toshiro Doi, Fukuoka, JP;
Tadakazu Miyashita, Nagano, JP;
Atsushi Kajikura, Nagano, JP;
Toshiro DOI, Fukuoka, JP;
National University Corporation Nagaoka University of Technology, Niigata, JP;
Fujikoshi Machinery Corp., Nagano, JP;
Abstract
A work processing apparatus performs processing of a surface to be processed of a work by causing a processing head to come into sliding contact with the work held on an upper surface of a holding plate. The processing head includes a plasma electrode that generates plasma and radiates the plasma to the surface to be processed of the work. In the plasma electrode, an annular or solid cylindrical central electrode provided at a center in a radial direction and an annular outer circumferential electrode provided at an outer side in the radial direction with respect to the central electrode are arranged with an annular slit portion intermediating therebetween at a boundary position thereof, the slit portion is configured as a plasma generation space, and a processing pad is provided at bottom surfaces of the central electrode and the outer circumferential electrode.