The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Dec. 12, 2018
Applicants:

Posco, Pohang-si, KR;

Research Institute of Industrial Science & Technology, Pohang-si, KR;

Inventors:

Hwang Yol Ryu, Pohang-si, KR;

Ki Sung You, Pohang-si, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 4/134 (2010.01); H01M 4/1395 (2010.01); H01M 10/04 (2006.01); H01M 10/054 (2010.01); H01M 10/058 (2010.01);
U.S. Cl.
CPC ...
H01M 4/134 (2013.01); H01M 4/1395 (2013.01); H01M 10/0404 (2013.01); H01M 10/054 (2013.01); H01M 10/058 (2013.01);
Abstract

The present invention relates to a material injection scheduling method for producing a precursor having a concentration gradient using an apparatus for producing a precursor having a concentration gradient mixing materials of a first feed tank and a second feed tank with each other in advance in a mixer and injecting the mixed material into a reactor.


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