The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Feb. 28, 2022
Applicant:

Toppan Inc., Tokyo, JP;

Inventors:

Tomohiro Nakagome, Taito-ku, JP;

Yu Ookubo, Taito-ku, JP;

Assignee:

TOPPAN Inc., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14629 (2013.01); H01L 27/14627 (2013.01);
Abstract

A photoelectric conversion device including a substrate including a charge generation region, a dielectric layer formed on the substrate, and a phase adjustment layer formed on the dielectric layer and having an upper surface and a lower surface. In a cross-sectional view of the photoelectric conversion device, a first plane extends parallel to the substrate in contact with the upper surface of the phase adjustment layer, a second plane is the lower surface of the phase adjustment layer, and the phase adjustment layer is formed such that the reflected light which has entered the first plane perpendicularly to the photoelectric conversion device and travels from the first plane to the second plane has an optical path length that varies depending on a position where the reflected light is incident on the first plane.


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