The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Feb. 12, 2019
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Tetsuya Kamimura, Haibara-gun, JP;

Satomi Takahashi, Haibara-gun, JP;

Yukihisa Kawada, Haibara-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 1/66 (2012.01); G03F 7/00 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); G03F 1/66 (2013.01); G03F 7/0012 (2013.01); G03F 7/038 (2013.01); G03F 7/16 (2013.01); G03F 7/325 (2013.01); G03F 7/70033 (2013.01); H01L 21/027 (2013.01);
Abstract

An object of the present invention is to provide a solution which is excellent in both the temporal stability of an organic solvent and the defect inhibition properties. Another object of the present invention is to provide a solution storage body storing the solution, an actinic ray-sensitive or radiation-sensitive resin composition containing the solution, and a pattern forming method and a manufacturing method of a semiconductor device using the solution. The solution of the present invention is a solution containing an organic solvent and a stabilizer, in which a content of the stabilizer with respect to a total mass of the solution is 0.1 to 50 mass ppm.


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