The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Jan. 12, 2024
Applied Materials, Inc., Santa Clara, CA (US);
Dermot Cantwell, Sunnyvale, CA (US);
Quentin Ernie Walker, Fremont, CA (US);
Serghei Malkov, Hayward, CA (US);
Jatinder Kumar, Milpitas, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and systems for RF pulse monitoring and RF pulsing parameter optimization at a manufacturing system are provided. Sensor data is received from one or more sensors that indicates an RF pulse waveform detected within the processing chamber. One or more RF signal characteristics are identified in the detected RF pulse waveform. Each identified RF signal characteristic corresponds to at least one RF signal pulse of the RF signal pulsing within the processing chamber. A determination is made, based on the identified one or more RF signal characteristics, whether the detected RF pulse waveform corresponds to the target RF pulse waveform. An indication of whether the detected RF pulse waveform corresponds to the target RF pulse waveform is provided to a client device.