The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Dec. 02, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xiangjin Xie, Fremont, CA (US);
Carmen Leal Cervantes, Mountain View, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/54 (2006.01); C23C 14/00 (2006.01); C23C 14/02 (2006.01); C23C 14/08 (2006.01); C23C 14/52 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/547 (2013.01); C23C 14/0036 (2013.01); C23C 14/025 (2013.01); C23C 14/087 (2013.01); C23C 14/52 (2013.01); H01L 21/02252 (2013.01);
Abstract
Methods for monitoring process chambers using a controllable plasma oxidation process followed by a controlled reduction process and metrology are described. In some embodiments, the metrology comprises measuring the reflectivity of the metal oxide film formed by the controllable plasma oxidation process and the reduced metal film or surface modified film formed by reducing the metal oxide film.