The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Mar. 30, 2019
Applicant:

Virginia Tech Intellectual Properties, Inc., Blacksburg, VA (US);

Inventors:

Daniel Rau, Blacksburg, VA (US);

Jana Herzberger, Blacksburg, VA (US);

Timothy Long, Blacksburg, VA (US);

Christopher Williams, Blacksburg, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 70/00 (2020.01); C08G 69/40 (2006.01); C09D 11/101 (2014.01); C09D 11/102 (2014.01); C09D 11/38 (2014.01); B29C 64/124 (2017.01); B29K 79/00 (2006.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
C09D 11/102 (2013.01); B33Y 70/00 (2014.12); C08G 69/40 (2013.01); C09D 11/101 (2013.01); C09D 11/38 (2013.01); B29C 64/124 (2017.08); B29K 2079/08 (2013.01); B33Y 10/00 (2014.12);
Abstract

In various aspects, a polymer resin is provided for vat or ultraviolet-assisted direct ink writing (UV-DIW) photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can be formed, for instance, by the addition of a diamine to a suitable dianhydride. Methods of additive manufacturing using the resins are also provided.


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