The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Dec. 07, 2020
Applicant:

Kuraray Europe Gmbh, Hattersheim, DE;

Inventors:

Tomoka Shirouchi, Tsukuba, JP;

Kenta Takemoto, Tsukuba, JP;

Takuro Niimura, Tsukuba, JP;

Atsuhiro Nakahara, Tsukuba, JP;

Yoshiaki Asanuma, Kurashiki, JP;

Assignee:

KURARAY EUROPE GmbH, Hattersheim, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/14 (2006.01); B32B 17/10 (2006.01); C08F 6/16 (2006.01); C08F 8/44 (2006.01); C08F 210/02 (2006.01); C08F 220/06 (2006.01); C08F 220/18 (2006.01); C08J 3/14 (2006.01); C08J 5/18 (2006.01);
U.S. Cl.
CPC ...
C08F 220/14 (2013.01); B32B 17/10036 (2013.01); C08F 6/16 (2013.01); C08F 8/44 (2013.01); C08F 210/02 (2013.01); C08F 220/06 (2013.01); C08F 220/1802 (2020.02); C08J 3/14 (2013.01); C08J 5/18 (2013.01);
Abstract

The present invention relates to a method of manufacturing an ionomer resin, comprising the steps of: (i) adding a poor solvent to a crude ionomer resin solution comprising a (meth)acrylic acid unit (A), a neutralized (meth)acrylic acid unit (B) and an ethylene unit (C) to allow a granular resin with a peak top particle size of from 50 to 700 μm to be precipitated; and (ii) washing the precipitated granular resin with a washing solution; wherein the total amount of the unit (A) and the unit (B) is from 6 to 10 mol % based on the entire monomeric units constituting the crude ionomer resin.


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