The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Oct. 10, 2018
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Shigeki Yasuda, Annaka, JP;
Munenao Hirokami, Annaka, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
An organic silicon compound having a ketimine structure having good storage stability can be obtained by a production method that produces an organic silicon compound having a ketimine structure indicated by formula (1) Rand Reach independently indicating a C1-10 alkyl group or a C6-10 aryl group, Rand Reach independently indicating a hydrogen atom, a C1-10 alkyl group, or a C6-10 aryl group, n indicating an integer of 1-3, and m indicating an integer of 1-12. The method includes steps (I) and (II) and has a chlorine atom content relative to the organic silicon compound indicated by formula (1) of less than 0.1 mass ppm. Step (I): an amino group-containing silicon compound indicated by formula (2) and a carbonyl compound indicated by formula (3) are caused to react. R-R, n, and m are as described above. Step (II): the chlorine atom content is reduced.