The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

Apr. 25, 2022
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Christopher Murray Beard, Allen, TX (US);

Song Zheng, Fairview, TX (US);

John Wesley Hamlin, III, Dallas, TX (US);

Win-Jae Jessie Yuan, Dallas, TX (US);

Kelly Jay Taylor, Allen, TX (US);

Jose Antonio Martinez Soto, Murphy, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00396 (2013.01); B81C 1/00523 (2013.01); B81C 2201/013 (2013.01); B81C 2201/0176 (2013.01); B81C 2201/0181 (2013.01); B81C 2201/0198 (2013.01);
Abstract

In an example, a method includes depositing an organic polymer layer on one or more material layers. The method also includes thermally curing the organic polymer layer. The method includes depositing a hard mask on the organic polymer layer and depositing a photoresist layer on the hard mask. The method also includes patterning the photoresist layer to expose at least a portion of the hard mask. The method includes etching the exposed portion of the hard mask to expose at least a portion of the organic polymer layer. The method also includes etching the exposed portion of the organic polymer layer to expose at least a portion of the one or more material layers.


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