The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2025

Filed:

May. 31, 2022
Applicant:

Qualcomm Incorporated, San Diego, CA (US);

Inventors:

Songwon Jee, San Jose, CA (US);

Yunxiang Liu, Kirkland, WA (US);

William Morrison, San Francisco, CA (US);

Assignee:

QUALCOMM Incorporated, San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B64G 1/28 (2006.01); B64G 1/24 (2006.01); G01S 5/02 (2010.01); G01S 19/42 (2010.01);
U.S. Cl.
CPC ...
B64G 1/28 (2013.01); B64G 1/244 (2019.05); G01S 5/0218 (2020.05); G01S 19/42 (2013.01); B64G 1/245 (2023.08); G01S 19/428 (2013.01);
Abstract

Aspects presented herein may enable a positioning device or entity to perform PR measurement error detection and classification based on SV geometry via ML. In one aspect, a UE or a location server determines for each SV of a set of SVs at least a geometric orientation with respect to the UE. The UE or the location server determines, based on an ML classifier and the determined geometric orientation with respect to the UE for each SV of at least a subset of the set of SVs, a relative PR weight for each SV of the set of SVs. The UE or the location server estimates a position of the UE based on PR measurements of each SV of the set of SVs and the relative PR weight for each SV of the set of SVs.


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