The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Nov. 06, 2019
Applicant:
Bmf Precision Technology (Wuxi) Inc., Wuxi, CN;
Inventor:
Chunguang Xia, San Diego, CA (US);
Assignee:
BMF Nano Material Technology Co., Ltd., Shenzhen, CN;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); B29C 64/124 (2017.01); B29C 64/40 (2017.01); B33Y 10/00 (2015.01); B33Y 40/20 (2020.01); B33Y 50/02 (2015.01); B33Y 70/00 (2020.01); B29K 33/00 (2006.01); B29K 71/00 (2006.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B29C 64/124 (2017.08); B29C 64/40 (2017.08); B33Y 10/00 (2014.12); B33Y 40/20 (2020.01); B33Y 50/02 (2014.12); B33Y 70/00 (2014.12); B29K 2033/26 (2013.01); B29K 2071/02 (2013.01);
Abstract
Parallel surfaces on two substrates are established with specific distances of separation, typically within a 10-micron tolerance. In general, one surface is a surface of a transparent membrane or hard window. On one embodiment, the gap defined by the distance of the transparent membrane or hard window and the other surface used to precisely control the dimensions of layers in projection micro stereolithography, however the methods for establishing the relative positions of two surfaces can be adapted to other applications.