The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Oct. 05, 2021
Applicant:
Sandisk Technologies Llc, Addison, TX (US);
Inventors:
Katsufumi Okamoto, Yokkaichi, JP;
Monica Titus, Santa Clara, CA (US);
Assignee:
Sandisk Technologies, Inc., Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 43/27 (2023.01); H10B 41/27 (2023.01);
U.S. Cl.
CPC ...
H10B 43/27 (2023.02); H10B 41/27 (2023.02);
Abstract
An alternating stack of first material layers and second material layers is formed over a substrate. A hard mask layer is formed over the alternating stack and cavities are formed in the hard mask layer. A cladding liner is formed on sidewalls of the cavities in the hard mask layer. Via openings are formed through each layer within the alternating stack by performing an anisotropic etch process that transfers a pattern of the cavities through the alternating stack.