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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12249498 B1

PDFFull Text
Date of Patent:
Mar. 11, 2025

Filed:

Nov. 10, 2020

Sputter deposition

Applicant:

Dyson Technology Limited, Wiltshire, GB;

Inventors:

Michael Edward Rendall, Newbury, GB;

Robert Ian Joseph Gruar, Swindon, GB;

Assignee:

Dyson Technology Limited, Malmesbury, GB;

Attorney:

Tucker Ellis LLP

Primary Examiner:

Michael A Band

Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3488 (2013.01); C23C 14/35 (2013.01); C23C 14/50 (2013.01); C23C 14/562 (2013.01); H01J 37/32743 (2013.01); H01J 37/32788 (2013.01); H01J 37/3435 (2013.01); C23C 14/34 (2013.01);
Abstract

A sputter deposition apparatus including: a substrate support assembly arranged to support a substrate; a target support assembly arranged to support at least one sputter target for use in a sputter deposition of a target material onto the substrate; a plasma generation arrangement arranged to provide plasma for said sputter deposition; and a cartridge arranged to contain the substrate with deposited target material after said sputter deposition. The cartridge is removable from the sputter deposition apparatus.

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Rendall, Michael. (2025). Sputter deposition (U.S. Patent No. 12249498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12249498

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