The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

Sep. 27, 2021
Applicant:

Amazon Technologies, Inc., Seattle, WA (US);

Inventors:

Anurag Beniwal, Redmond, WA (US);

Meet Taraviya, Los Angeles, CA (US);

Yen-Liang Lin, Aliso Viejo, CA (US);

Larry Davis, Brooklyn, NY (US);

Assignee:

Amazon Technologies, Inc., Seattle, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/08 (2023.01); G06F 18/21 (2023.01); G06Q 10/083 (2023.01);
U.S. Cl.
CPC ...
G06N 3/08 (2013.01); G06F 18/21 (2023.01); G06Q 10/083 (2013.01);
Abstract

Systems and methods are described for recommending pairs or sets of clothing items for an individual to wear together, including learning a compatibility metric personalized to each individual. A framework is used to learn compatibility that is personalized to the user based on initial item feedback that may be received from the user via user interfaces that prompt the user to indicate whether the user would wear certain clothing items together and/or individually.


Find Patent Forward Citations

Beniwal, Anurag. (2025). Machine learning framework for personalized clothing compatibility (U.S. Patent No. 12248872). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12248872

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…