The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Jan. 14, 2022
Dell Products L.p., Round Rock, TX (US);
Senthil Ponnuswamy, San Jose, CA (US);
Mahadev Karadigudda, San Jose, CA (US);
Madhu Agrahara Gopalakrishna, Fremont, CA (US);
Praveen Kumar Lakkimsetti, Hayward, CA (US);
Dell Products L.P., Round Rock, TX (US);
Abstract
Embodiments of the runtime risk assessment process monitors deliberate or potentially data destructive operations against a filter of dynamic risk assessment. A filter process recognizes the following conditions as highly indicative of increased risk factors: (1) recent creation of the security officer role, (2) changing of the system time or clock, and (3) disabling of system alerts. If all three of these events occur, the system recognizes this as indicative of a high probability of data attack. The runtime risk assessment process imposes a delay on the execution of each of these commands to provide time to alert the user and an opportunity to re-enter the commands at the end of the delay period. Thus, a potentially dangerous sequence of commands will not occur automatically or immediately, but will instead be delayed to provide an extra validation check or user action.