The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

Feb. 25, 2021
Applicant:

Hitachi, Ltd., Tokyo, JP;

Inventors:

Masumi Kawakami, Tokyo, JP;

Yasufumi Suzuki, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/36 (2006.01); G06F 11/362 (2025.01);
U.S. Cl.
CPC ...
G06F 11/3636 (2013.01);
Abstract

A defect analysis apparatus includes an execution log (program execution log) of a program (source code) in an input. The defect analysis apparatus includes an analysis start point acquisition unit configured to acquire, from the execution log and as an analysis start point, a statement of the program in which an exception occurs; an analysis end point acquisition unit configured to acquire, as an analysis end point, a function directly or indirectly calling a function including the analysis start point; and a symbolic execution engine configured to perform reverse symbolic execution from the analysis start point to the analysis end point and output an execution path.


Find Patent Forward Citations

Kawakami, Masumi. (2025). Defect analysis apparatus, program, and defect analysis method (U.S. Patent No. 12248391). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12248391

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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