The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Jul. 20, 2020
Applicant:
Rolic Technologies Ag, Allschwil, CH;
Inventors:
David Pires, Giebenach, CH;
Richard Frantz, Village-Neuf, FR;
Assignee:
ROLIC TECHNOLOGIES AG, Allschwil, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/13363 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133634 (2013.01); G02F 1/133788 (2013.01);
Abstract
The present invention relates to material compositions and methods for generating photo-alignable positive c-plate retarders. Because a planar alignment direction can be induced in the surface of the above c-plate retarder by exposure to polarized light, a slave material can be aligned on the surface of the c-plate retarder with a defined azimuthal orientation direction, without the need of an additional orientation layer.