The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Nov. 17, 2021
The Hong Kong University of Science and Technology, Hong Kong, CN;
Jianan Qu, Hong Kong, CN;
Zhongya Qin, Hong Kong, CN;
The Hong Kong University of Science and Technology, Hong Kong, CN;
Abstract
Provided herein is a method for identifying and correcting optical aberrations within a sample under optical microscopy. The method includes providing a plurality of optical beams including at least a first optical beam and a second optical beam; modulating at least one of the optical beams at one or more frequencies; providing a combined optical beam at least partially superimposed in time by the first optical beam and the second optical beam; focusing the combined optical beam into the sample; detecting a first signal excited by the combined optical beam in the sample; demodulating the first signal by at least one lock-in amplifier to obtain a second signal including performing a plurality of measurements of spatial positions of the first optical beam with respect to the second optical beam; identifying and correcting the optical aberrations by the second signal through obtaining the electric-field point spread function of the optical beams.