The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2025

Filed:

Dec. 19, 2018
Applicant:

University of Florida Research Foundation, Inc., Gainesville, FL (US);

Inventors:

Sin-Yen Leo, Gainesville, FL (US);

Peng Jiang, Gainesville, FL (US);

Zhuxiao Gu, Gainesville, FL (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/118 (2015.01); C03C 17/00 (2006.01); C03C 17/25 (2006.01); G02B 1/12 (2006.01);
U.S. Cl.
CPC ...
G02B 1/118 (2013.01); C03C 17/004 (2013.01); C03C 17/005 (2013.01); C03C 17/25 (2013.01); G02B 1/12 (2013.01); C03C 2217/213 (2013.01); C03C 2217/732 (2013.01); C03C 2218/111 (2013.01); C03C 2218/115 (2013.01); C03C 2218/32 (2013.01);
Abstract

Described herein are antireflective layers, methods for forming antireflective layers, and structures including antireflective layers. Methods are included for forming a durable antireflective layer on the surface of a substrate, wherein the substrate has a complex three-dimensional shape, wherein the durable antireflective layer comprises a uniform monolayer of silica nanoparticles interconnected by SiO, a uniform monolayer of silica nanoparticles bonded to the surface of the substrate, or a combination thereof.


Find Patent Forward Citations

Leo, Sin-Yen. (2025). Methods of forming an antireflective layer on a complex substrate and complex substrates having the antireflective layer (U.S. Patent No. 12248123). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12248123

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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