The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Dec. 17, 2020
Lg Electronics Inc., Seoul, KR;
Seungjoon Kim, Seoul, KR;
Jongryong Kim, Seoul, KR;
Jekwang Choi, Seoul, KR;
Seungchul Park, Seoul, KR;
LG Electronics Inc., Seoul, KR;
Abstract
A method controls a garment processing device and includes rotating a drum inside a tub at a first rate, measuring a degree of imbalance of laundry while rotating the drum at the first rate, increasing the rate of rotation to a second rate based on a first measurement being less than or equal to a first reference value, rotating the drum at a second rate, measuring the degree of imbalance while rotating the drum at the second rate, stopping rotation of the drum based on a second measurement being less than or equal to a second reference value, accelerating the drum to a third rate higher than the second rate, thereby removing water from the garments, and stopping rotation of the drum based on the degree of imbalance of the drum becoming larger than an imbalance reference value that is set based on the second measured value.