The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Jul. 17, 2019
Nhk Spring Co., Ltd., Yokohama, JP;
Izumi Techno Inc., Okaya, JP;
Toshihiko Hanamachi, Kanagawa, JP;
Shuhei Morota, Kanagawa, JP;
Go Takahara, Kanagawa, JP;
Masaru Takimoto, Kanagawa, JP;
Hibiki Yokoyama, Kanagawa, JP;
Hiroshi Mitsuda, Kanagawa, JP;
Yoshihito Araki, Kanagawa, JP;
Kengo Ajisawa, Nagano, JP;
NHK Spring Co., Ltd., Yokohama, JP;
IZUMI TECHNO INC., Okaya, JP;
Abstract
A member for a plasma processing device includes: an aluminum base material; and an oxide film formed on the aluminum base material and having a porous structure, the oxide film including a first oxide film formed on a surface of the aluminum base material, a second oxide film formed on the first oxide film, and a third oxide film formed on the second oxide film, wherein the first oxide film is harder than the second oxide film and the third oxide film, and a hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.