The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2025
Filed:
Dec. 16, 2021
Applicant:
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Inventors:
Martin Thürer, Bitterfeld-Wolfen, DE;
Walter Lehmann, Kleinostheim, DE;
Martin Trommer, Bitterfelf-Wolfen, DE;
Assignee:
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 37/018 (2006.01);
U.S. Cl.
CPC ...
C03B 37/01853 (2013.01); C03B 37/01815 (2013.01); C03B 2201/02 (2013.01);
Abstract
Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least ⅔ of the maximum horizontally integrated luminous intensity of the flame.