The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2025

Filed:

Sep. 29, 2021
Applicant:

The Boeing Company, Chicago, IL (US);

Inventors:

Philip T. Chiu, La Crescenta, CA (US);

Dhananjay M. Bhusari, Santa Clarita, CA (US);

Richard Thai, Woodland Hills, CA (US);

Assignee:

The Boeing Company, Arlington, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H10F 10/142 (2025.01); H10F 10/161 (2025.01); H10F 10/19 (2025.01); H10F 71/00 (2025.01); H10F 77/20 (2025.01); H10F 77/70 (2025.01); H01L 31/0224 (2006.01); H01L 31/0236 (2006.01); H01L 31/0687 (2012.01); H01L 31/0725 (2012.01); H01L 31/078 (2012.01);
U.S. Cl.
CPC ...
H10F 77/211 (2025.01); H10F 10/142 (2025.01); H10F 10/161 (2025.01); H10F 10/19 (2025.01); H10F 71/127 (2025.01); H10F 71/137 (2025.01); H10F 77/707 (2025.01);
Abstract

A method for fabricating an upright photovoltaic cell comprises growing one or more epitaxial layers on a substrate, thereby forming a diffused active junction on the substrate and one more additional active junctions above the diffused active junction. The method further comprises selectively etching an areal region of the one or more epitaxial layers, thereby forming a mesa on the substrate and exposing a substrate-contact region parallel to the areal region at a base of the mesa. The method further comprises depositing contact material onto the substrate-contact region, to form the first contact, and concertedly onto a mesa-contact region of the mesa, to form the second contact.


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