The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2025

Filed:

Mar. 29, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Gerhard Ingmar Meijer, Zurich, CH;

Valery Weber, Gattikon, CH;

Peter Willem Jan Staar, Zurich, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/29 (2006.01); C07C 381/12 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/29 (2013.01); C07C 381/12 (2013.01); G03F 7/2004 (2013.01);
Abstract

In an approach to improve the field of photoacid generators (PAGs) through a new photoacid generator, in particular to a photoacid generator comprising a new polycyclic aromatic photoacid generator compound anion, and a photoresist composition, comprising said photoacid generator. Embodiments the present invention relate to a method of generating an acid using said photoresist composition and a method of forming a patterned materials feature on a substrate.


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