The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
May. 06, 2024
China Electronic Product Reliability and Environmental Testing Research Institute (The Fifth Electronic Research Institute of Ministry of Industry and Information Technology) (Ceprei), Guangzhou, CN;
South China University of Technology, Guangzhou, CN;
Weiheng Shao, Guangzhou, CN;
Yinghui Chen, Guangzhou, CN;
Yiqiang Chen, Guangzhou, CN;
Changjian Zhou, Guangzhou, CN;
Abstract
The present disclosure relates to an asymmetric compensation method and apparatus for a two-port near field probe, a device, and a storage medium. The method includes: obtaining a first scattering parameter collected by a symmetric two-port network established based on a symmetric two-port near field probe; obtaining a second scattering parameter collected by an asymmetric two-port network established based on an asymmetric element; obtaining an overall response of a calibration network in a magnetic field environment, the calibration network being established based on the symmetric two-port near field probe and the asymmetric element; calculating a calibration factor based on the scattering parameter of the symmetric two-port near field probe, the scattering parameter of the asymmetric element, and the overall response of the calibration network in the magnetic field environment; and compensating the symmetric two-port near field probe according to a calibration factor.