The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2025

Filed:

Nov. 06, 2020
Applicant:

Apr Technologies Ab, Enköping, SE;

Inventors:

Mikael Antelius, Täby, SE;

Henrik Löfgren, Uppsala, SE;

Are Björneklett, Västerås, SE;

Peter Nilsson, Sundbyberg, SE;

Robert Thorslund, Sigtuna, SE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01); F04B 17/00 (2006.01); F04B 19/04 (2006.01); F28F 13/16 (2006.01);
U.S. Cl.
CPC ...
F28F 13/16 (2013.01); F04B 17/00 (2013.01); F04B 19/04 (2013.01); G21K 5/00 (2013.01);
Abstract

A method for altering one or more properties of a dielectric fluid for use in an electrohydrodynamic, EHD, thermal management system (), as well as the system, are provided. The system comprises at least one EHD pump unit () comprising at least two electrodes for pumping the dielectric fluid and at least one enclosure () for accommodating the fluid within the system. The method comprises exposing the dielectric fluid to an ionizing process () configured to ionize the dielectric fluid, and operating the pump unit to circulate the exposed fluid in the enclosure.


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