The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Dec. 16, 2020
Applicant:
Posco, Pohang-si, KR;
Inventors:
Seng-Ho Yu, Pohang-si, KR;
Nam-Young Cho, Seoul, KR;
Assignee:
POSCO, Pohang-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22C 38/00 (2006.01); C21D 6/00 (2006.01); C21D 8/02 (2006.01); C21D 9/46 (2006.01); C22C 38/02 (2006.01); C22C 38/04 (2006.01); C22C 38/06 (2006.01); C22C 38/22 (2006.01); C22C 38/24 (2006.01); C22C 38/26 (2006.01);
U.S. Cl.
CPC ...
C21D 9/46 (2013.01); C21D 6/002 (2013.01); C21D 6/005 (2013.01); C21D 6/008 (2013.01); C21D 8/0205 (2013.01); C21D 8/0226 (2013.01); C21D 8/0263 (2013.01); C22C 38/002 (2013.01); C22C 38/02 (2013.01); C22C 38/04 (2013.01); C22C 38/06 (2013.01); C22C 38/22 (2013.01); C22C 38/24 (2013.01); C22C 38/26 (2013.01); C21D 2211/002 (2013.01); C21D 2211/008 (2013.01);
Abstract
A wear resistant steel material has high hardness and excellent cut crack reistance, that can be applied to a thick steel material of which the thickness is 60 mm or more, that is not cracked even after being cut using gas, and a method of manufacturing the wear resistant steel material provides high hardness and excellent cut crack resistance.
Yu, Seng-Ho. (2025). Wear resistant steel material with excellent cut crack resistance and method of manufacturing same (U.S. Patent No. 12241138). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12241138
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile