The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Jul. 01, 2021
Carbon, Inc., Redwood City, CA (US);
Anant Chimmalgi, Los Altos, CA (US);
Jiayao Zhang, Mountain View, CA (US);
James Michael Ian Bennett, San Francisco, CA (US);
Bob E. Feller, San Mateo, CA (US);
CARBON, INC., Redwood City, CA (US);
Abstract
A method of making an object on a bottom-up stereolithography apparatus is provided. The apparatus includes a light source, a drive assembly, and a controller operatively associated with the light source and the drive assembly, with the light source and/or the drive assembly having at least one adjustable parameter that is adjustable by the controller. The method includes installing a removable window cassette on the apparatus in a configuration through which the light source projects, the window cassette comprising an optically transparent member having a build surface on which an object can be produced, and with the optically transparent member having and at least one variable property therein; and then modifying the at least one adjustable parameter by the controller based on the at least one variable optical property of the window; and then producing the object on the build surface from a light-polymerizable liquid by bottom-up stereolithography.