The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Oct. 05, 2020
Leibniz-institut Für Plasmaforschung Und Technologie E.v., Greifswald, DE;
Rayk Kohls, Dersekow, DE;
Klaus-Dieter Weltmann, Ostseebad Binz, DE;
Philipp Turski, Greifswald, DE;
Norbert Lembke, Greifswald, DE;
Torsten Gerling, Greifswald, DE;
Laura Vilardell Scholten, Greifswald, DE;
Stefan Horn, Loissin, DE;
LEIBNIZ-INSTITUT FÜR PLASMAFORSCHUNG UND TECHNOLOGIE E.V., Greifswald, DE;
Abstract
The invention relates to a system () for generating and controlling a non-thermal atmospheric pressure plasma, comprising: —a discharge space () into which a working gas can be introduced via a first opening (), wherein a plasma () can be generated in the discharge space (), wherein the discharge space () has a second opening (), so that the plasma () can exit from the discharge space () through this second opening () and —at least one high-voltage electrode () for generating an electromagnetic field for generating a plasma () in the discharge space (). The plasma () exiting through the second opening () is controlled by a throughflow controller () of the system (), which throughflow controller () is designed to adjust a volume flow () of the working gas through the first opening () from a working gas source () into the discharge space (). In this case, the throughflow controller () is further designed to assume at least a first state and a second state, wherein in the first state no working gas is supplied from the working gas source () to the discharge space (), so that no plasma () exits from the second opening () even when there is a generated electromagnetic field in the discharge space (), and wherein in the second state the working gas is supplied from the working gas source () to the discharge space (), a plasma () is generated in the discharge space () and the plasma () exits from the second opening ().