The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Apr. 24, 2023
Immervision, Inc., Montreal, CA;
Patrice Roulet, Montreal, CA;
Pierre Konen, Saint-Bruno, CA;
Jocelyn Parent, Lavaltrie, CA;
Simon Thibault, Quebec City, CA;
Xavier Dallaire, Verdun, CA;
Zhenfeng Zhuang, Montreal, CA;
IMMERVISION, INC., Montreal, CA;
Abstract
A method to design miniature wide-angle and ultra-wide-angle lenses by using on-purpose distortion to have shorter focal length than usual for a given image sensor size and a desired image projection. This results in optical systems having miniaturization ratio, defined as the ratio between the total track length and the image footprint diameter, smaller than 0.8. The resulting image from these systems having on-purpose distortion can then be processed with a processor to remove the on-purpose distortion and to output an image with the targeted distortion profile.