The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Mar. 09, 2022
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Toshiba Electronic Devices & Storage Corporation, Tokyo, JP;

Inventors:

Takahiro Ogata, Himeji Hyogo, JP;

Teruyuki Ohashi, Kawasaki Kanagawa, JP;

Hiroshi Kono, Himeji Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 27/088 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7811 (2013.01); H01L 27/088 (2013.01); H01L 29/1608 (2013.01); H01L 29/7804 (2013.01); H01L 29/7806 (2013.01);
Abstract

A semiconductor device of embodiments includes: an element region including a transistor, a first diode, and a first contact portion; a termination region surrounding the element region and including a second contact portion; and an intermediate region provided between the element region and the termination region and not including the transistor, the first diode, the first contact portion, and the second contact portion. The element region includes a first electrode, a second electrode, a gate electrode, a silicon carbide layer, and a gate insulating layer. The termination region includes a first wiring layer electrically connected to the first electrode, the second electrode, and the silicon carbide layer. The intermediate region includes the silicon carbide layer. The width of the intermediate region in a direction from the element region to the termination region is equal to or more than twice the thickness of the silicon carbide layer.


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